Segments - Atomic Layer Deposition (ALD) Market by Product (Catalytic, Plasma Enhanced, Aluminum Oxide, Metal, and Others), Application (Medical Equipment, Electronics, Solar Devices, Semiconductors, and Others), and Regions (Asia Pacific, North America, Latin America, Europe, and Middle East & Africa) - Global Industry Analysis, Growth, Share, Size, Trends, and Forecast 2023 – 2031
The Atomic Layer Deposition (ALD) Market was USD 2.12 Billion in 2022 and is likely to reach USD 7.46 Billion by 2031, expanding at a CAGR of 15% during 2023 – 2031. The growth of the market is attributed to the increasing semiconductor solutions and electronics industry.
A vapor phase technique called "Atomic Layer Deposition" (ALD) is used to apply thin coatings to a surface. ALD involves systematically adding alternating precursors rather than overlapping precursors, which are applied to a substrate's surface. An advanced deposition process called atomic layer deposition enables the carefully regulated deposition of ultra-thin films with a thickness of only a few nanometers.
High aspect-ratio structures can be covered with a transdermal coating on 3D structures because of ALD's exceptional thickness control and homogeneity. The method is self-limiting, and the capability of a conformal deposition that results from this is what makes it important as a scaling and 3D enabler. ALD can still be used with some thermally unstable precursors as long as their decomposition rate is moderate as it frequently takes place at lower temperatures, which is advantageous when working with delicate surfaces.
The ALD technique is popular because it produces incredibly precise ultra-thin nano-layers on a range of substrates, including micron- to sub-micron-sized particles. ALD produces pinhole-free and conformal nanolayers by nature. As electronics become compact, one of the most common uses for ALD thin films is in the semiconductor manufacturing industry.
The thin films and coatings created by ALD contribute to the further reduction in size of these goods while maintaining the high level of performance we expect from consumer electronics. ALD is a well-known method for reducing the cost of manufacturing advanced electrical products. Precision optical layers are created using ALD for a variety of particular applications, enhancing the brightness and durability of LEDs.
The Covid-19 pandemic affected the demand and supply of the global atomic layer deposition market. Lockdown across the globe, supply chain disorders, and oscillating supply of raw materials forced manufacturers to shut down production leading to an unfortunate decline in market growth. Launch of vaccines to combat the Covid-19 pandemic is expected to contribute to the market growth over the forecast period.
The market research report on the global atomic layer deposition market provides a detailed analysis by focusing on revenue growth, facts, figures, and historical data to determine major drivers, existing restraints, key opportunities, and competitive analysis. The report includes recent developments that can shape the overall performance of the market during the assessment period, 2023 to 2031.
New technologies like 3D NAND are being introduced with the growing demand for NAND storage. 3D NAND offers high storage capacity due to the multiple-story stacking of layers of memory structures. As a result, ALD technologies aid in the production of 3D NAND by enabling the precise and controlled deposition of a number of layers on the substrate to provide a stacked structure and thus, increase its storage capacity. As a result, 3D NAND systems use ALD to produce dielectric layers. Thus, the rising demand for NAND storage is anticipated to boost the market.
High cost of ALD has resulted in low investment in technology. Due to the fact that CVD systems are less expensive than ALD systems, the semiconductor industry had begun using them as replacements. Moreover, high operational and initial cost of ALD is projected to hamper the atomic layer deposition market growth.
The demand for atomic layer deposition has increased recently. Rising demand for advanced smartwatches, smartphones, high ADL utilization in several medical equipment such as wearable health monitoring devices & implants, increasing demand for intricate and small parts are major factors estimated to create immense growth opportunities for the key players in the market.
Moreover, green energy to address growing environmental concerns, use of renewable energy sources, such as solar electricity, growing government programs to support the next generation, and high demand for semiconductors from the automobile industry are propelling the market.
The global atomic layer deposition market research report includes an assessment of the market trends, segments, and regional markets. Overview and dynamics have also been included in the report.
Attributes |
Details |
Report Title |
Atomic Layer Deposition Market - Global Industry Analysis, Growth, Share, Size, Trends, and Forecast |
Base Year |
2022 |
Historic Data |
2016–2021 |
Forecast Period |
2023 – 2031 |
Segmentation |
Product (Catalytic, Plasma Enhanced, Aluminum Oxide, Metal, and Others) and Application (Medical Equipment, Electronics, Solar Devices, Semiconductors, and Others) |
Regional Scope |
Asia Pacific, North America, Latin America, Europe, and Middle East & Africa |
Report Coverage |
Company Share, Market Analysis and Size, Competitive Landscape, Growth Factors, Market Trends, and Revenue Forecast |
Key Players Covered in the Report |
ADEKA CORPORATION; AIXTRON; ALD NanoSolutions, Inc.; Applied Materials, Inc.; ASM International; Beneq Oy; Canon Anvela Corporation; Canon Anvela Corporation; Denton Vacuum LLC; Encapsulix; Entergis Inc.; Hitachi Kokusai Electric Inc.; Kurt J. Lesker Company; LAM RESEARCH CORPORATION; Merck KGaA; Oxford Instruments; Picosun Oy; SENTECH Instruments GmbH; Tokyo Electron Limited; ULTRATECH, INC.; and Veeco Instruments |
Based on product, the market is segregated into catalytic, plasma enhanced, aluminum oxide, metal, and others. The aluminum oxide segment accounted for a key market share in 2021 and is projected to continue its dominance during the forecast period. The demand for aluminum oxide film made with this deposition method is predicted to rise along with the availability of aluminum.
The aluminum oxide layer is known to have efficient penetration barriers because of the regularity and lack of pinholes in alumina. Aluminum oxide film holds the key share of the technology due to its optimal base metal prices, easy availability of precursor material, stability to numerous substrates, and superior qualities.
The plasma-enhanced segment to grow at a rapid pace during the projected period. A key trend in the sector is technological advancements in precursor materials and substrates. As a result of the developments, the plasma-enhanced atomic layer deposition (PEALD) segment is expected to grow at a high CAGR in the coming years. The features of PEALD, such as thickness controllability and improved conformance, are major enablers of logic devices and nanoscale memory.
When compared to other standard atomic layer deposition methods, the plasma enhanced atomic layer deposition method allows for deposition at extremely low temperatures, which helps to create films with high robustness. The enhanced plasma atomic layer deposition approach is also utilized to modify surfaces by altering adhesion and nucleation through plasma exposure. For instance, ALD on polymers reduces many problems with space polymers.
On the basis of application, the market is fragmented into medical equipment, electronics, solar devices, semiconductors, and others. The semiconductors segment accounted for a market share of around 40% in 2021. Growth of the segment is attributed to the revolution in semiconductor technology nodes and the increasing demand for small components.
The range of applications for deposition technologies has significantly expanded due to the need for a device with decreasing size and high endurance. Applications of semiconductor technology can be found in both non-IC components and IC (Integrated Circuit). Semiconductors effectively control the flow of electricity and have several applications due to their power efficiency, miniature size, reliability, and low cost.
The solar devices segment is estimated to expand at a grow at a rapid pace during the forecast period. Growth of the segment is attributed to shifting consumer preferences and government efforts to decrease greenhouse gas emissions. In solar cells and other devices, the method is frequently employed for conformal coatings.
In terms of region, the market is classified as Asia Pacific, North America, Latin America, Europe, and Middle East & Africa. Asia Pacific dominated the market in 2021 and is projected to continue its dominance during the forecast period. The use of the atomic layer deposition technology has expanded as a result of the region's major economies, including Taiwan, South Korea, Japan, and China, where semiconductor and electronics output is huge.
This drives the market in the region. Moreover, investments and government initiatives in countries such as India are attracting FDI for the establishment of various industrial production facilities. Growth of the market in the region is attributed to the proliferation of electronics product manufacturing, incredible modernization, growing economies, and rising consumer electronics consumption.
Asia Pacific is estimated to hold the key market share in the atomic layer deposition market owing to rising demand from end-use industries such as the solar sector, medical equipment industry, electronics, and semiconductors. The development of solar infrastructure is receiving increased funding from countries with high energy expenditures, such as India and Japan, which is projected to increase demand for the atomic layer deposition technique.
The market in North America is anticipated to grow at a rapid pace during the forecast period. Growth of the market in the region is attributed to increased investments in solar energy research & development. The demand for the atomic layer deposition technology in the region is being indirectly boosted by the rising demand for car penetration in the region as a result of the increased demand for transportation infrastructure.
The global atomic layer deposition market has been segmented on the basis of
Key players competing in the atomic layer deposition market include ADEKA CORPORATION; AIXTRON; ALD NanoSolutions, Inc.; Applied Materials, Inc.; ASM International; Beneq Oy; Canon Anvela Corporation; Canon Anvela Corporation; Denton Vacuum LLC; Encapsulix; Entergis Inc.; Hitachi Kokusai Electric Inc.; Kurt J. Lesker Company; LAM RESEARCH CORPORATION; Merck KGaA; Oxford Instruments; Picosun Oy; SENTECH Instruments GmbH; Tokyo Electron Limited; ULTRATECH, INC.; and Veeco Instruments.
Some of these players are using several market strategies such as acquisitions, mergers, collaborations, partnerships, capacity expansion, and product launches to enhance their market shares, generate revenue, and raise their production line of business in the coming years. For instance,
Kurt J. Lesker Company; LAM RESEARCH CORPORATION; Merck KGaA; Oxford Instruments; Picosun Oy; SENTECH Instruments GmbH; Tokyo Electron Limited; ULTRATECH, INC.; and Veeco Instruments are some of the leading players in the atomic layer deposition market.
The atomic layer deposition market size was around USD 1840 million in 2021.
The atomic layer deposition market is projected to reach USD 6586 million by 2030.
The atomic layer deposition market is anticipated to expand at a Compound Annual Growth Rate (CAGR) of 15% during the forecast period, 2022 – 2030.
Increasing demand for NAND storage is expected to fuel the atomic layer deposition market.
Product and applications are the segments provided in the atomic layer deposition market report.
Medical equipment, electronics, solar devices, semiconductors, and others are the products covered in the atomic layer deposition market report.