Semiconductor Wafer Polishing and Grinding Systems Market Size, Trends [2032]

Semiconductor Wafer Polishing and Grinding Systems Market Size, Trends [2032]

Segments - by Equipment Type (Polishing Equipment, Grinding Equipment, CMP Equipment, Others), by Wafer Size (150 mm, 200 mm, 300 mm, Others), by Application (Front-End Wafer Processing, Back-End Wafer Processing, Wafer Thinning), by End-user (Foundries, IDMs, Others)

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Report Description


Semiconductor Wafer Polishing and Grinding Systems Market Outlook 2032

The semiconductor wafer polishing and grinding systems market size was USD 4.6 Billion in 2023 and is projected to reach USD 8.7 Billion by 2032, expanding at a CAGR of 7.3% during 2024–2032.

Innovations such as in-situ measurement systems for real-time thickness control and advanced materials for grinding wheels are examples of technological developments that have significantly impacted this market segment. The demand for grinding equipment is driven by the semiconductor industry's expansion and the introduction of new materials and complex device structures, which require highly controlled and precise material removal capabilities.

Semiconductor Wafer Polishing and Grinding Systems Market Outlook

Additionally, polishing equipment in the back-end processing is used to remove any damage that might have been induced during the grinding phase, thereby preparing the wafer for high-quality dicing and packaging. The demand for back-end wafer polishing and grinding systems is influenced by the increasing complexity of semiconductor devices and the need for more robust and reliable packaging solutions, driving innovations that cater to these advanced requirements.

Semiconductor Wafer Polishing and Grinding Systems Market Dynamics

Drivers

The continuous demand for more advanced and efficient electronic devices drives the market. As consumer electronics, automotive electronics, and telecommunications devices increasingly require higher performance and miniaturization, the semiconductor industry is pushed to enhance chip performance while reducing size and cost.

This demand directly translates to the need for more precise and efficient wafer polishing and grinding systems that can produce high-quality wafers essential for advanced semiconductor manufacturing. Additionally,
the transition towards larger wafer sizes, such as the shift from 200 mm to 300 mm wafers, necessitates the adoption of new and upgraded polishing and grinding equipment capable of handling these larger wafers with high precision.

The global expansion of the semiconductor manufacturing base, with new fabs being constructed in regions such as Asia Pacific and North America, fueled by local government incentives and the strategic need for regional self-sufficiency in semiconductor production. This expansion is creating additional demand for the equipment needed to set up and operate these fabs.

Restraints

The high cost associated with advanced polishing and grinding systems hinders the market. The development, maintenance, and operation of these systems require significant capital investment, which can be a barrier, particularly for smaller players or new entrants. Additionally, the rapid pace of technological change in semiconductor manufacturing demands frequent upgrades and replacements of existing systems, adding to operational costs.

The stringent quality requirements and the need for precision in wafer processing, which require constant technological advancements in polishing and grinding systems. Any failure to meet these precise standards can lead to significant yield losses and reduced profitability for semiconductor manufacturers.

Opportunities

The ongoing technological evolution in the semiconductor industry, such as the development of next-generation chips and materials opens new avenues in the market. Companies that can innovate and provide solutions tailored to these new materials and technologies may capture significant market share.

Additionally,
the push towards localizing semiconductor production in various regions around the world creates opportunities for equipment manufacturers to establish strong local partnerships and supply chains, potentially lowering operational costs and improving market penetration.

There is also a growing trend towards sustainability in manufacturing, prompting the development of more energy-efficient and environmentally friendly polishing and grinding systems. Companies that c
an lead in this area may not only benefit from cost savings but also from increased goodwill and compliance with future regulations.

Scope of the Semiconductor Wafer Polishing and Grinding Systems Market Report

The market report includes an assessment of the market trends, segments, and regional markets. Overview and dynamics are included in the report.

Attributes

Details

Report Title

Semiconductor Wafer Polishing and Grinding Systems Market - Global Industry Analysis, Growth, Share, Size, Trends, and Forecast

Base Year

2023

Historic Data

2017 -2022

Forecast Period

2024–2032

Segmentation

Equipment Type (Polishing Equipment, Grinding Equipment, CMP Equipment, and Others), Wafer Size (150 mm, 200 mm, 300 mm, and Others), Application (Front-End Wafer Processing, Back-End Wafer Processing, and Wafer Thinning), End-user (Foundries, IDMs, and Others)

Regional Scope

Asia Pacific, North America, Latin America, Europe, and Middle East & Africa

Report Coverage

Company Share, Market Analysis and Size, Competitive Landscape, Growth Factors, MarketTrends, and Revenue Forecast

Key Players Covered in the Report

Applied Materials, Inc.; EBARA Technologies, Inc.; Tokyo Electron Limited; Lam Research Corporation; Disco Corporation; AMAT; KLA Corporation; Hitachi High-Technologies Corporation; ASM International N.V.; Veeco Instruments Inc.; Rudolph Technologies, Inc.; Ultratech, Inc.; Nikon Corporation; Canon Inc.; ASML Holding N.V.; Mitsubishi Electric Corporation; Advantest Corporation; SCREEN Holdings Co., Ltd.; Teradyne, Inc.; and Kulicke& Soffa Industries, Inc.

Semiconductor Wafer Polishing and Grinding Systems Market Segment Insights

Equipment Type Segment Analysis

Polishing equipment segment dominates the semiconductor wafer polishing and grinding systems market as it is crucial for achieving the smooth, defect-free surface required for high-performance semiconductor devices. This segment includes various types of machines such as chemical mechanical polishing (CMP) machines, which are particularly dominant.

Polishing equipment is designed to remove surface material from wafers using a combination of chemical slurry and mechanical force applied through a rotating pad.

The primary use of this equipment is in the final stages of wafer preparation, where achieving ultra-flat surfaces is critical for the subsequent fabrication of integrated circuits. The demand for polishing equipment is driven by the need for higher precision and cleanliness in semiconductor production, which directly affects the performance and yield of semiconductor devices.

As device architectures become more complex and feature sizes continue to shrink, the role of advanced polishing equipment becomes more significant. The demand for polishing equipment is also propelled by the increasing production of larger wafer sizes, such as 300 mm wafers, which require more sophisticated and precise polishing solutions to maintain high throughput and quality standards.


Grinding equipment segment is gaining significant traction in the market, primarily used in the earlier stages of wafer processing to thin down the wafers before they undergo further fabrication processes. This equipment utilizes abrasive wheels or discs to remove excess material from the wafer, achieving the desired thickness and surface quality necessary for efficient and effective fabrication.

The grinding process is critical for both the performance and reliability of semiconductor devices, as it influences the thermal and mechanical properties of the silicon wafers. Technological advancements in grinding equipment have focused on improving the precision and efficiency of material removal, reducing sub-surface damage, and enhancing the overall throughput of the production process.

Semiconductor Wafer Polishing and Grinding Systems Market Type

Wafer Size Segment Analysis

The 200 mm wafer segment holds a major share of the semiconductor wafer polishing and grinding systems market, primarily due to its extensive use in numerous mature product categories. These wafers strike a balance between cost-efficiency and the technological capability to meet the demands of various mainstream electronics, including automotive components, power devices, and some types of consumer electronics.

The enduring relevance of 200 mm wafers is supported by the sustained demand for products that do not necessarily require cutting-edge process technologies, which are often more economically produced on these wafers. The infrastructure for 200 mm wafer production is well-established, with a broad base of suppliers and a mature technology ecosystem, which helps in maintaining their cost-effectiveness and widespread use.

Additionally, many semiconductor fabrication plants (fabs) that were set up for 200 mm wafer production continue to operate at full capacity, as transitioning to larger wafer sizes involves substantial capital investment. The benefits of 200 mm wafers include lower initial equipment and process development costs compared to larger wafers, making them a preferred choice for many applications where ultra-small feature sizes are not a requirement.


The 300 mm wafer segment is projected to experience significant growth in the market, driven by the semiconductor industry's push towards higher performance and lower cost per chip. These wafers offer significant advantages in terms of the economics of scale, as they provide more than twice the number of chips per wafer compared to 200 mm wafers, effectively reducing the cost per chip when the fabs are operating at full capacity.

The transition to 300 mm wafers has been propelled by the need for greater efficiency and productivity in semiconductor manufacturing, as the industry targets more advanced technology nodes and larger volumes. However, the shift to 300 mm wafers comes with challenges, including higher initial capital expenditures for equipment and more complex handling and processing requirements due to the larger size and weight of the wafers.

Despite these challenges, the opportunities associated with 300 mm wafers are substantial, as they support the mass production of high-performance chips for applications such as smartphones, servers, and high-end computing devices. The demand for 300 mm wafer polishing and grinding equipment is characterized by rapid technological advancements aimed at improving process control, yield, and throughput to maximize the benefits of this wafer size.

Application Segment Analysis

Front-end wafer processing dominates the semiconductor wafer polishing and grinding systems market, encompassing the initial stages of semiconductor manufacturing where the electronic devices are patterned and fabricated on the wafer. This segment involves numerous complex and precision-driven processes including lithography, etching, chemical vapor deposition (CVD), physical vapor deposition (PVD), and various forms of doping and implantation, all of which require the wafer surface to be meticulously prepared.

Polishing and grinding systems are essential in this phase to ensure the wafers are perfectly flat and free of any defects that could affect the integrity of the microstructures being built on them. The demand for equipment in front-end processing is driven by the need for high precision and consistency, as even minor imperfections can lead to significant yield losses and device failures.

The technological advancements in this segment focus on enhancing the precision, efficiency, and automation of the polishing and grinding processes. This includes the development of more advanced control systems, better measurement and inspection technologies, and materials that can withstand the increasingly harsh process conditions of advanced manufacturing techniques.

As device geometries continue to shrink, the role of effective wafer polishing and grinding in front-end processing becomes even more critical, pushing the boundaries of what these systems can achieve in terms of surface smoothness and uniformity.


Back-end wafer processing segment is gaining significant traction in the market, involves the steps that come after the front-end processing, primarily focusing on wafer dicing, packaging, and assembly. In this stage, the individual circuits are separated and packaged into their final form, ready for use in electronic devices.

The role of polishing and grinding in back-end processing is centered around ensuring that the wafers are adequately thinned and have smooth, defect-free surfaces before they are diced into individual chips. This is crucial as any imperfections can lead to cracking or other damage during the dicing process, adversely affecting the yield and reliability of the semiconductor devices.

Grinding systems used in back-end processing are particularly designed to handle the delicate nature of thinned wafers, incorporating advanced technologies to minimize sub-surface damage and improve the accuracy of the thickness reduction process.

Semiconductor Wafer Polishing and Grinding Systems Market Application

End-User Segment Analysis

Integrated Device Manufacturers (IDMs) segment dominates the market. IDMs are the companies that design, manufacture, and sell their own semiconductor devices, controlling the entire production process from design to device fabrication and even to final product assembly.

This end-user segment of the semiconductor wafer polishing and grinding systems market is characterized by its need for highly integrated and customized equipment solutions that can support a diverse range of products and technologies under one roof. IDMs are particularly focused on adapting to new technologies that can improve the efficiency and output of their fabrication plants while maintaining the flexibility to innovate and customize products according to specific market needs.

As technology evolves, IDMs are increasingly investing in advanced polishing and grinding systems that offer superior precision and automation capabilities. These systems are crucial for IDMs to achieve the high standards of quality and reliability demanded by their product portfolios, which often include high-performance computing devices and consumer electronics.

The ability to rapidly adapt to changing technologies and market demands is a key competitive advantage for IDMs, making the choice of the right wafer polishing and grinding systems a strategic priority. This segment's investment in next-generation equipment is driven by the dual needs of technological advancement and cost efficiency, aiming to optimize the balance between innovation and profitability in a highly competitive market.


Foundries segment is projected to experience significant growth in the market. As specialized facilities dedicated to semiconductor manufacturing, foundries play a pivotal role in the production of a wide array of electronic devices. They operate by manufacturing chips for design companies that do not have their own fabrication facilities.

The demand dynamics for polishing and grinding systems in foundries are influenced by the need for high-volume, high-quality, and cost-effective production. Foundries are continually upgrading their equipment to keep pace with the advancing technology nodes, which require increasingly precise and defect-free wafer surfaces to ensure high yields.

The push towards smaller geometries and larger wafer sizes, such as the shift from 200 mm to 300 mm wafers, necessitates the adoption of advanced polishing and grinding systems that can handle these stringent specifications. Additionally, the competitive nature of the foundry market drives the continuous improvement of these systems to enhance throughput and reduce operational costs.

Foundries are major purchasers of state-of-the-art polishing and grinding equipment, as maintaining cutting-edge capability is essential for attracting and retaining customers who require the latest and most advanced semiconductor components.

Regional Analysis

The Asia Pacific dominates the semiconductor wafer polishing and grinding systems market, driven by the presence of major semiconductor manufacturing countries such as South Korea, Taiwan, Japan, and increasingly, China. This region is home to some of the world’s largest foundries and IDMs, which contribute significantly to the demand for advanced polishing and grinding systems.

The growth factors in Asia Pacific include rapid industrialization, the expansion of technological infrastructure, and substantial investments in semiconductor manufacturing capacity expansion. Additionally, the local governments often provide supportive policies, including subsidies and tax incentives, which further stimulate the semiconductor industry's growth.

However, the region faces challenges such as intense competition both within the region and globally, and the need for continuous innovation to keep up with technological advancements. Moreover, geopolitical tensions and trade disputes can impact supply chain dynamics and market stability, posing risks to the sustained growth of the semiconductor industry in this region.


The market in the North America is anticipated to witness the fastest growth in the market during the forecast period, characterized by its technological leadership and innovation. The region is renowned for its high-tech research and development capabilities, particularly in the US, where many leading semiconductor companies have their headquarters.

These companies are at the forefront of adopting new technologies, including AI and IoT, which drive the demand for more sophisticated semiconductor devices and, consequently, for advanced wafer polishing and grinding systems. The market in the region is also influenced by industry trends such as the increasing complexity of semiconductor device structures and the shift towards silicon carbide (SiC) and gallium nitride (GaN) based devices, which require specialized manufacturing processes.

Technological advancements in the region are often supported by strong intellectual property regimes and significant investments in R&D by both private and public sectors. However, the market is also navigating challenges such as the need for a skilled workforce and the high cost of setting up and maintaining advanced manufacturing facilities.

Despite these challenges, North America continues to push the boundaries of what's possible in semiconductor technology, significantly impacting global market dynamics.

Semiconductor Wafer Polishing and Grinding Systems Market Region

Segments

The Semiconductor Wafer Polishing and Grinding Systems Market has been segmented on the basis of

Equipment Type

  • Polishing Equipment
  • Grinding Equipment
  • CMP Equipment
  • Others

Wafer Size

  • 150 mm
  • 200 mm
  • 300 mm
  • Others

Application

  • Front-End Wafer Processing
  • Back-End Wafer Processing
  • Wafer Thinning

End-user

  • Foundries
  • IDMs
  • Others

Region

  • Asia Pacific
  • North America
  • Latin America
  • Europe
  • Middle East & Africa

Key Players

  • Applied Materials, Inc.
  • EBARA Technologies, Inc.
  • Tokyo Electron Limited
  • Lam Research Corporation
  • Disco Corporation; AMAT
  • KLA Corporation
  • Hitachi High-Technologies Corporation
  • ASM International N.V.
  • Veeco Instruments Inc.
  • Rudolph Technologies, Inc.
  • Ultratech, Inc.
  • Nikon Corporation
  • Canon Inc.
  • ASML Holding N.V.
  • Mitsubishi Electric Corporation
  • Advantest Corporation
  • SCREEN Holdings Co., Ltd.
  • Teradyne, Inc.
  • Kulicke
  • Soffa Industries, Inc.

Competitive Landscape

Key players in the semiconductor wafer polishing and grinding systems market are Applied Materials, Inc.; EBARA Technologies, Inc.; Tokyo Electron Limited; Lam Research Corporation; Disco Corporation; AMAT; KLA Corporation; Hitachi High-Technologies Corporation; ASM International N.V.; Veeco Instruments Inc.; Rudolph Technologies, Inc.; Ultratech, Inc.; Nikon Corporation; Canon Inc.; ASML Holding N.V.; Mitsubishi Electric Corporation; Advantest Corporation; SCREEN Holdings Co., Ltd.; Teradyne, Inc.; and Kulicke& Soffa Industries, Inc.

The market has also seen significant recent developments and mergers & acquisitions, which are strategic moves by companies to strengthen their market positions and expand their technological capabilities. For instance,

  • In December 2024, Tokyo Electron launchedUlucusLX, an extreme laser lifts off system for 300mm wafer-bonded devices.

    Semiconductor Wafer Polishing and Grinding Systems Market Keyplayers

Table Of Content

Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Semiconductor Wafer Polishing and Grinding Systems Market Overview
   4.1 Introduction
      4.1.1 Market Taxonomy
      4.1.2 Market Definition
      4.1.3 Macro-Economic Factors Impacting the Market Growth
   4.2 Semiconductor Wafer Polishing and Grinding Systems Market Dynamics
      4.2.1 Market Drivers
      4.2.2 Market Restraints
      4.2.3 Market Opportunity
   4.3 Semiconductor Wafer Polishing and Grinding Systems Market - Supply Chain Analysis
      4.3.1 List of Key Suppliers
      4.3.2 List of Key Distributors
      4.3.3 List of Key Consumers
   4.4 Key Forces Shaping the Semiconductor Wafer Polishing and Grinding Systems Market
      4.4.1 Bargaining Power of Suppliers
      4.4.2 Bargaining Power of Buyers
      4.4.3 Threat of Substitution
      4.4.4 Threat of New Entrants
      4.4.5 Competitive Rivalry
   4.5 Global Semiconductor Wafer Polishing and Grinding Systems Market Size & Forecast, 2023-2032
      4.5.1 Semiconductor Wafer Polishing and Grinding Systems Market Size and Y-o-Y Growth
      4.5.2 Semiconductor Wafer Polishing and Grinding Systems Market Absolute $ Opportunity

Chapter 5 Global Semiconductor Wafer Polishing and Grinding Systems Market Analysis and Forecast By Equipment Type
   5.1 Introduction
      5.1.1 Key Market Trends & Growth Opportunities By Equipment Type
      5.1.2 Basis Point Share (BPS) Analysis By Equipment Type
      5.1.3 Absolute $ Opportunity Assessment By Equipment Type
   5.2 Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Equipment Type
      5.2.1 Polishing Equipment
      5.2.2 Grinding Equipment
      5.2.3 CMP Equipment
      5.2.4 Others
   5.3 Market Attractiveness Analysis By Equipment Type

Chapter 6 Global Semiconductor Wafer Polishing and Grinding Systems Market Analysis and Forecast By Wafer Size
   6.1 Introduction
      6.1.1 Key Market Trends & Growth Opportunities By Wafer Size
      6.1.2 Basis Point Share (BPS) Analysis By Wafer Size
      6.1.3 Absolute $ Opportunity Assessment By Wafer Size
   6.2 Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Wafer Size
      6.2.1 150 mm
      6.2.2 200 mm
      6.2.3 300 mm
      6.2.4 Others
   6.3 Market Attractiveness Analysis By Wafer Size

Chapter 7 Global Semiconductor Wafer Polishing and Grinding Systems Market Analysis and Forecast By Application
   7.1 Introduction
      7.1.1 Key Market Trends & Growth Opportunities By Application
      7.1.2 Basis Point Share (BPS) Analysis By Application
      7.1.3 Absolute $ Opportunity Assessment By Application
   7.2 Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Application
      7.2.1 Front-End Wafer Processing
      7.2.2 Back-End Wafer Processing
      7.2.3 Wafer Thinning
   7.3 Market Attractiveness Analysis By Application

Chapter 8 Global Semiconductor Wafer Polishing and Grinding Systems Market Analysis and Forecast By End-user
   8.1 Introduction
      8.1.1 Key Market Trends & Growth Opportunities By End-user
      8.1.2 Basis Point Share (BPS) Analysis By End-user
      8.1.3 Absolute $ Opportunity Assessment By End-user
   8.2 Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By End-user
      8.2.1 Foundries
      8.2.2 IDMs
      8.2.3 Others
   8.3 Market Attractiveness Analysis By End-user

Chapter 9 Global Semiconductor Wafer Polishing and Grinding Systems Market Analysis and Forecast by Region
   9.1 Introduction
      9.1.1 Key Market Trends & Growth Opportunities By Region
      9.1.2 Basis Point Share (BPS) Analysis By Region
      9.1.3 Absolute $ Opportunity Assessment By Region
   9.2 Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Region
      9.2.1 North America
      9.2.2 Europe
      9.2.3 Asia Pacific
      9.2.4 Latin America
      9.2.5 Middle East & Africa (MEA)
   9.3 Market Attractiveness Analysis By Region

Chapter 10 Coronavirus Disease (COVID-19) Impact 
   10.1 Introduction 
   10.2 Current & Future Impact Analysis 
   10.3 Economic Impact Analysis 
   10.4 Government Policies 
   10.5 Investment Scenario

Chapter 11 North America Semiconductor Wafer Polishing and Grinding Systems Analysis and Forecast
   11.1 Introduction
   11.2 North America Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast by Country
      11.2.1 U.S.
      11.2.2 Canada
   11.3 Basis Point Share (BPS) Analysis by Country
   11.4 Absolute $ Opportunity Assessment by Country
   11.5 Market Attractiveness Analysis by Country
   11.6 North America Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Equipment Type
      11.6.1 Polishing Equipment
      11.6.2 Grinding Equipment
      11.6.3 CMP Equipment
      11.6.4 Others
   11.7 Basis Point Share (BPS) Analysis By Equipment Type 
   11.8 Absolute $ Opportunity Assessment By Equipment Type 
   11.9 Market Attractiveness Analysis By Equipment Type
   11.10 North America Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Wafer Size
      11.10.1 150 mm
      11.10.2 200 mm
      11.10.3 300 mm
      11.10.4 Others
   11.11 Basis Point Share (BPS) Analysis By Wafer Size 
   11.12 Absolute $ Opportunity Assessment By Wafer Size 
   11.13 Market Attractiveness Analysis By Wafer Size
   11.14 North America Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Application
      11.14.1 Front-End Wafer Processing
      11.14.2 Back-End Wafer Processing
      11.14.3 Wafer Thinning
   11.15 Basis Point Share (BPS) Analysis By Application 
   11.16 Absolute $ Opportunity Assessment By Application 
   11.17 Market Attractiveness Analysis By Application
   11.18 North America Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By End-user
      11.18.1 Foundries
      11.18.2 IDMs
      11.18.3 Others
   11.19 Basis Point Share (BPS) Analysis By End-user 
   11.20 Absolute $ Opportunity Assessment By End-user 
   11.21 Market Attractiveness Analysis By End-user

Chapter 12 Europe Semiconductor Wafer Polishing and Grinding Systems Analysis and Forecast
   12.1 Introduction
   12.2 Europe Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast by Country
      12.2.1 Germany
      12.2.2 France
      12.2.3 Italy
      12.2.4 U.K.
      12.2.5 Spain
      12.2.6 Russia
      12.2.7 Rest of Europe
   12.3 Basis Point Share (BPS) Analysis by Country
   12.4 Absolute $ Opportunity Assessment by Country
   12.5 Market Attractiveness Analysis by Country
   12.6 Europe Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Equipment Type
      12.6.1 Polishing Equipment
      12.6.2 Grinding Equipment
      12.6.3 CMP Equipment
      12.6.4 Others
   12.7 Basis Point Share (BPS) Analysis By Equipment Type 
   12.8 Absolute $ Opportunity Assessment By Equipment Type 
   12.9 Market Attractiveness Analysis By Equipment Type
   12.10 Europe Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Wafer Size
      12.10.1 150 mm
      12.10.2 200 mm
      12.10.3 300 mm
      12.10.4 Others
   12.11 Basis Point Share (BPS) Analysis By Wafer Size 
   12.12 Absolute $ Opportunity Assessment By Wafer Size 
   12.13 Market Attractiveness Analysis By Wafer Size
   12.14 Europe Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Application
      12.14.1 Front-End Wafer Processing
      12.14.2 Back-End Wafer Processing
      12.14.3 Wafer Thinning
   12.15 Basis Point Share (BPS) Analysis By Application 
   12.16 Absolute $ Opportunity Assessment By Application 
   12.17 Market Attractiveness Analysis By Application
   12.18 Europe Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By End-user
      12.18.1 Foundries
      12.18.2 IDMs
      12.18.3 Others
   12.19 Basis Point Share (BPS) Analysis By End-user 
   12.20 Absolute $ Opportunity Assessment By End-user 
   12.21 Market Attractiveness Analysis By End-user

Chapter 13 Asia Pacific Semiconductor Wafer Polishing and Grinding Systems Analysis and Forecast
   13.1 Introduction
   13.2 Asia Pacific Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast by Country
      13.2.1 China
      13.2.2 Japan
      13.2.3 South Korea
      13.2.4 India
      13.2.5 Australia
      13.2.6 South East Asia (SEA)
      13.2.7 Rest of Asia Pacific (APAC)
   13.3 Basis Point Share (BPS) Analysis by Country
   13.4 Absolute $ Opportunity Assessment by Country
   13.5 Market Attractiveness Analysis by Country
   13.6 Asia Pacific Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Equipment Type
      13.6.1 Polishing Equipment
      13.6.2 Grinding Equipment
      13.6.3 CMP Equipment
      13.6.4 Others
   13.7 Basis Point Share (BPS) Analysis By Equipment Type 
   13.8 Absolute $ Opportunity Assessment By Equipment Type 
   13.9 Market Attractiveness Analysis By Equipment Type
   13.10 Asia Pacific Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Wafer Size
      13.10.1 150 mm
      13.10.2 200 mm
      13.10.3 300 mm
      13.10.4 Others
   13.11 Basis Point Share (BPS) Analysis By Wafer Size 
   13.12 Absolute $ Opportunity Assessment By Wafer Size 
   13.13 Market Attractiveness Analysis By Wafer Size
   13.14 Asia Pacific Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Application
      13.14.1 Front-End Wafer Processing
      13.14.2 Back-End Wafer Processing
      13.14.3 Wafer Thinning
   13.15 Basis Point Share (BPS) Analysis By Application 
   13.16 Absolute $ Opportunity Assessment By Application 
   13.17 Market Attractiveness Analysis By Application
   13.18 Asia Pacific Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By End-user
      13.18.1 Foundries
      13.18.2 IDMs
      13.18.3 Others
   13.19 Basis Point Share (BPS) Analysis By End-user 
   13.20 Absolute $ Opportunity Assessment By End-user 
   13.21 Market Attractiveness Analysis By End-user

Chapter 14 Latin America Semiconductor Wafer Polishing and Grinding Systems Analysis and Forecast
   14.1 Introduction
   14.2 Latin America Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast by Country
      14.2.1 Brazil
      14.2.2 Mexico
      14.2.3 Rest of Latin America (LATAM)
   14.3 Basis Point Share (BPS) Analysis by Country
   14.4 Absolute $ Opportunity Assessment by Country
   14.5 Market Attractiveness Analysis by Country
   14.6 Latin America Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Equipment Type
      14.6.1 Polishing Equipment
      14.6.2 Grinding Equipment
      14.6.3 CMP Equipment
      14.6.4 Others
   14.7 Basis Point Share (BPS) Analysis By Equipment Type 
   14.8 Absolute $ Opportunity Assessment By Equipment Type 
   14.9 Market Attractiveness Analysis By Equipment Type
   14.10 Latin America Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Wafer Size
      14.10.1 150 mm
      14.10.2 200 mm
      14.10.3 300 mm
      14.10.4 Others
   14.11 Basis Point Share (BPS) Analysis By Wafer Size 
   14.12 Absolute $ Opportunity Assessment By Wafer Size 
   14.13 Market Attractiveness Analysis By Wafer Size
   14.14 Latin America Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Application
      14.14.1 Front-End Wafer Processing
      14.14.2 Back-End Wafer Processing
      14.14.3 Wafer Thinning
   14.15 Basis Point Share (BPS) Analysis By Application 
   14.16 Absolute $ Opportunity Assessment By Application 
   14.17 Market Attractiveness Analysis By Application
   14.18 Latin America Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By End-user
      14.18.1 Foundries
      14.18.2 IDMs
      14.18.3 Others
   14.19 Basis Point Share (BPS) Analysis By End-user 
   14.20 Absolute $ Opportunity Assessment By End-user 
   14.21 Market Attractiveness Analysis By End-user

Chapter 15 Middle East & Africa (MEA) Semiconductor Wafer Polishing and Grinding Systems Analysis and Forecast
   15.1 Introduction
   15.2 Middle East & Africa (MEA) Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast by Country
      15.2.1 Saudi Arabia
      15.2.2 South Africa
      15.2.3 UAE
      15.2.4 Rest of Middle East & Africa (MEA)
   15.3 Basis Point Share (BPS) Analysis by Country
   15.4 Absolute $ Opportunity Assessment by Country
   15.5 Market Attractiveness Analysis by Country
   15.6 Middle East & Africa (MEA) Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Equipment Type
      15.6.1 Polishing Equipment
      15.6.2 Grinding Equipment
      15.6.3 CMP Equipment
      15.6.4 Others
   15.7 Basis Point Share (BPS) Analysis By Equipment Type 
   15.8 Absolute $ Opportunity Assessment By Equipment Type 
   15.9 Market Attractiveness Analysis By Equipment Type
   15.10 Middle East & Africa (MEA) Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Wafer Size
      15.10.1 150 mm
      15.10.2 200 mm
      15.10.3 300 mm
      15.10.4 Others
   15.11 Basis Point Share (BPS) Analysis By Wafer Size 
   15.12 Absolute $ Opportunity Assessment By Wafer Size 
   15.13 Market Attractiveness Analysis By Wafer Size
   15.14 Middle East & Africa (MEA) Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By Application
      15.14.1 Front-End Wafer Processing
      15.14.2 Back-End Wafer Processing
      15.14.3 Wafer Thinning
   15.15 Basis Point Share (BPS) Analysis By Application 
   15.16 Absolute $ Opportunity Assessment By Application 
   15.17 Market Attractiveness Analysis By Application
   15.18 Middle East & Africa (MEA) Semiconductor Wafer Polishing and Grinding Systems Market Size Forecast By End-user
      15.18.1 Foundries
      15.18.2 IDMs
      15.18.3 Others
   15.19 Basis Point Share (BPS) Analysis By End-user 
   15.20 Absolute $ Opportunity Assessment By End-user 
   15.21 Market Attractiveness Analysis By End-user

Chapter 16 Competition Landscape 
   16.1 Semiconductor Wafer Polishing and Grinding Systems Market: Competitive Dashboard
   16.2 Global Semiconductor Wafer Polishing and Grinding Systems Market: Market Share Analysis, 2023
   16.3 Company Profiles (Details – Overview, Financials, Developments, Strategy) 
      16.3.1 Applied Materials, Inc. EBARA Technologies, Inc. Tokyo Electron Limited Lam Research Corporation Disco Corporation; AMAT KLA Corporation Hitachi High-Technologies Corporation ASM International N.V. Veeco Instruments Inc. Rudolph Technologies, Inc. Ultratech, Inc. Nikon Corporation Canon Inc. ASML Holding N.V. Mitsubishi Electric Corporation Advantest Corporation SCREEN Holdings Co., Ltd. Teradyne, Inc. Kulicke  Soffa Industries, Inc.

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