Semiconductor Chemical Mechanical Polishing (CMP) System Market Share [2032]

Semiconductor Chemical Mechanical Polishing (CMP) System Market Share [2032]

Segments - by Product Type (CMP Equipment and CMP Consumables), by Application (Memory, Logic, Foundry, Others), by End-user (Integrated Device Manufacturers, Foundries, Others)

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Report Description


Semiconductor Chemical Mechanical Polishing (CMP) System Market Outlook 2032

The Semiconductor Chemical Mechanical Polishing (CMP) system market size was USD 3.3 Billion in 2023 and is projected to reach USD 6.0 Billion by 2032, expanding at a CAGR of 6.9% during 2024–2032.

The market for CMP in logic applications is driven by the continuous push for performance improvements and energy efficiency in computing and electronic devices, which in turn requires the development of new materials and CMP processes capable of handling the increasing complexity of logic chip architectures.

Semiconductor Chemical Mechanical Polishing (CMP) System Market Outlook

The growth of the segment is significantly influenced by the trends towards more complex device structures and the increasing stringency of surface finish requirements in advanced ICs. As the semiconductor industry continues to push the boundaries of miniaturization and performance, the role of CMP consumables becomes increasingly critical, driving the growth of the segment.

Semiconductor Chemical Mechanical Polishing (CMP) System Market Dynamics

Drivers

Technological advancements in CMP systems drive the market. As semiconductor devices become increasingly complex, with more layers and finer features, the precision and capabilities of CMP systems evolve.

Modern CMP systems are equipped with advanced control mechanisms and monitoring technologies that enhance the precision of the polishing process, reduce defect rates, and increase throughput. Innovations such as real-time monitoring and feedback mechanisms allow for adjustments during the CMP process, leading to better uniformity and surface quality of wafers.


The development of new consumables, including advanced slurry formulations and pad technologies, plays a crucial role in meeting the stringent requirements of new semiconductor materials and structures, such as low-k dielectrics and copper interconnects.

These technological advancements not only improve the performance of CMP systems but also contribute to the overall efficiency and cost-effectiveness of semiconductor manufacturing processes, driving their adoption across the industry.


The growing demand for miniaturized semiconductors propels the market. As consumer electronics, such as smartphones, tablets, and wearable devices, continue to evolve, there is a growing need for smaller, more powerful semiconductor chips.

This trend towards miniaturization requires semiconductor manufacturers to utilize advanced manufacturing processes capable of producing high-density, low-power chips. CMP is critical in these processes, as it ensures the necessary planarity and surface smoothness that allow for the successful patterning and stacking of multiple layers.


The expansion of semiconductor manufacturing in emerging markets fuels the market. Countries such as China, India, and Vietnam are rapidly becoming important players in the global semiconductor industry, fueled by significant investments from both local governments and foreign companies. These investments are aimed at developing self-sufficient semiconductor ecosystems capable of supporting the growing demand for electronic devices within these regions and globally.

As these emerging markets build up their semiconductor manufacturing capabilities, there is an increasing demand for advanced manufacturing equipment, including CMP systems. The expansion not only increases the volume of CMP systems required but also opens up opportunities for the development of customized solutions tailored to the specific needs and challenges of these markets.

This geographical diversification is expected to contribute significantly to the growth of the global CMP system market, as new players enter the market and existing players expand their reach to capitalize on the opportunities presented by these emerging markets.

Restraints

The high cost associated with CMP equipment and consumables hinders the market. CMP systems are sophisticated pieces of equipment that require precise engineering and incorporate advanced technologies to ensure effective and efficient polishing. The development, manufacturing, and maintenance of these systems involve substantial costs. Similarly, the consumables used in the CMP process, such as pads and slurries, are specialized products that need to be frequently replaced and are tailored to specific polishing needs, adding to the operational costs.

The technical challenges of polishing these new materials can affect the efficiency of the CMP process, impacting production yields and costs. Developing CMP systems that can effectively handle a wide range of materials without compromising on quality is a significant challenge for equipment manufacturers. This requires ongoing research and development efforts and can lead to increased complexity and cost of CMP systems.

Opportunities

Innovations in CMP technology and materials create new opportunities in the market. As semiconductor devices shrink in size and increase in complexity, traditional CMP methods and materials may not suffice to meet the new requirements. Innovations such as advanced slurry formulations that offer better selectivity and removal rates, and novel pad designs that provide more uniform polishing, are critical to advancing CMP technology.

Moreover
, the integration of automation and real-time monitoring technologies in CMP systems can lead to more consistent and efficient processes, reducing variability and improving yield. The use of machine learning algorithms to analyze data from CMP processes can help in predicting and mitigating potential issues before they affect the wafer quality.

Scope of the Semiconductor Chemical Mechanical Polishing (CMP) System Market Report

The market report includes an assessment of the market trends, segments, and regional markets. Overview and dynamics are included in the report.

Attributes

Details

Report Title

Semiconductor Chemical Mechanical Polishing (CMP) System Market - Global Industry Analysis, Growth, Share, Size, Trends, and Forecast

Base Year

2023

Historic Data

2017 -2022

Forecast Period

2024–2032

Segmentation

Product Type (CMP Equipment and CMP Consumables), Application (Memory, Logic, Foundry, and Others), End-user (Integrated Device Manufacturers, Foundries, and Others)

Regional Scope

Asia Pacific, North America, Latin America, Europe, and Middle East & Africa

Report Coverage

Company Share, Market Analysis and Size, Competitive Landscape, Growth Factors, MarketTrends, and Revenue Forecast

Key Players Covered in the Report

Applied Materials Inc.; Ebara Corporation; Lam Research Corporation; Tokyo Electron Limited; Hitachi High-Technologies Corporation; ASM International N.V.; Disco Corporation; KLA Corporation; Rudolph Technologies Inc.; Veeco Instruments Inc.; Axus Technology; Revasum Inc.; Entrepix Inc.; SpeedFam Co., Ltd.; Logitech Ltd.; Lapmaster Wolters GmbH; Okamoto Machine Tool Works, Ltd.; Nanometrics Incorporated; Planar Semiconductor Inc.; and GigaMat Technologies Inc.

Semiconductor Chemical Mechanical Polishing (CMP) System Market Segment Insights

Product Type Segment Analysis

The CMP equipment segment holds a major share of the semiconductor CMP system market, driven by the continuous demand for advanced and efficient semiconductor devices. CMP equipment includes a variety of machines that integrate polishing pads, slurry distribution systems, and wafer carriers, all designed to achieve ultra-smooth surfaces required for semiconductor manufacturing.

The demand for CMP equipment is primarily fueled by the semiconductor industry's need for high precision and reliability in wafer planarization, which is critical for the subsequent manufacturing steps in multi-layered integrated circuits (ICs).  The growth of the segment is influenced by the scaling of technology nodes and the increasing complexity of device architectures, such as 3D structures, which require more intricate and precise polishing processes.

Additionally, major players in the CMP equipment market have been focusing on developing machines that can handle larger wafer sizes and those that integrate more advanced control systems for improved process monitoring and automation. The growth of the segment is also propelled by the expansion of semiconductor production facilities worldwide, especially in regions such as Asia Pacific, which is a hub for semiconductor manufacturing.


CMP consumables segment is projected to experience significant growth in the market, encompassing all materials used in the CMP process, such as pads, slurries, and conditioners. These consumables are critical for the CMP process, as they directly impact the quality and efficiency of wafer polishing. The demand for CMP consumables is largely driven by the need for materials that can provide consistent performance and high removal rates while minimizing defects on the wafer surface.

The innovation in CMP consumables focuses on developing new formulations that can reduce the total cost of ownership by extending the life of consumables and enhancing the efficiency of the CMP process. The demand for these consumables is closely tied to the production volumes of semiconductor devices, as each wafer typically undergoes multiple CMP steps during its processing.

Semiconductor Chemical Mechanical Polishing (CMP) System Market Type

Application Segment Analysis

The memory segment dominates the semiconductor CMP system market, owing to the rising demand for memory devices across various applications, including consumer electronics, enterprise storage, and automotive systems. Memory devices, such as DRAM (Dynamic Random Access Memory) and NAND flash, are critical for data storage and retrieval in computing devices, and their manufacturing requires multiple CMP steps to ensure the high precision and reliability demanded by these applications. The CMP process in memory manufacturing is crucial for achieving the necessary planarity and surface finish, which directly impacts the performance and yield of memory chips.

As memory technology advances, particularly with the development of 3D NAND and other complex memory structures, the requirements for CMP become more stringent, necessitating more precise and controlled polishing processes. This has led to a surge in demand for specialized CMP equipment and consumables tailored to meet the unique needs of memory production.

The growth of the segment is driven by technological advancements, capacity expansions by major memory manufacturers, and global demand trends for higher memory capacities and faster access speeds. The ongoing innovation in memory technology, with a focus on increasing the number of memory layers and reducing feature sizes, continues to drive the need for advancements in CMP technology, making this segment a critical area of focus for CMP system manufacturers and material suppliers.


The logic segment is expected to witness significant growth during the forecast period, encompassing the manufacture of processors and other logic circuits that form the brains of electronic devices. This segment includes the production of CPUs, GPUs, and custom ASICs, which are integral to a wide range of applications from personal computing devices to large data centers and AI applications.

The CMP process in logic chip manufacturing is essential for ensuring the device performance and reliability by achieving ultra-flat surfaces necessary for the intricate patterning of logic circuits. With the ongoing trend towards smaller process nodes and more complex integrated circuit designs, the logic segment demands highly sophisticated CMP systems capable of delivering extremely high levels of planarity and surface integrity.

Semiconductor Chemical Mechanical Polishing (CMP) System Market Application

End-user Segment Analysis

Integrated Device Manufacturers (IDMs) segment dominates the semiconductor CMP system market. IDMs are companies that handle the entire production process of semiconductor devices, from design and fabrication to assembly and testing, within their own facilities.

This vertical integration allows them to maintain tight control over their manufacturing processes, including CMP, which is critical for ensuring the high quality and performance of semiconductor devices. The CMP process is vital for IDMs as it directly affects the yield and reliability of the chips they produce, which are used in a wide range of applications from consumer electronics to automotive and industrial systems.


The demand for CMP systems by IDMs is driven by the need to achieve superior surface planarity and material removal accuracy, which are essential for the successful fabrication of advanced semiconductor devices with multi-layered structures and fine feature sizes. As IDMs continue to innovate and move towards more advanced technology nodes, the complexity of the CMP process increases, necessitating more sophisticated CMP equipment and consumables.

The growth of the segment is also influenced by the global expansion of semiconductor manufacturing capabilities and the increasing investment by IDMs in next-generation fabrication plants, especially in regions such as Asia Pacific and North America.


Foundries segment is gaining significant traction in the market, as foundries specialize in the manufacturing of semiconductor devices for other companies based on the designs provided by their customers. This model allows them to achieve economies of scale by focusing solely on the fabrication process, including CMP, which is a critical step in ensuring the surface quality and planarity required for high-performance semiconductor devices.

The demand for CMP systems in this segment is driven by the ongoing technological advancements in semiconductor design, such as the shift towards smaller process nodes and the integration of more complex structures such as FinFETs and 3D ICs. Foundries are continually upgrading their CMP technology to enhance their service offerings and maintain competitiveness in the market.

The growth of the segment is attributed to the overall health of the semiconductor industry and is particularly influenced by the outsourcing trends among technology companies that prefer to rely on foundries for their manufacturing needs. As the semiconductor industry continues to grow and diversify, the segment is projected to grow at a significant growth rate in the coming years.

Regional Analysis

Asia Pacific dominates the semiconductor CMP system market, primarily due to the concentration of major semiconductor manufacturing hubs in countries such as Taiwan, South Korea, Japan, and China. This region has witnessed substantial investments in semiconductor fabrication facilities, driven by the growing demand for electronic devices and components. The robust ecosystem of semiconductor production in the region is supported by a well-established supply chain, which includes numerous suppliers of CMP equipment and consumables.

The growth of the market is characterized by rapid technological advancements and the expansion of production capacities by leading semiconductor manufacturers. The region's dominance is further bolstered by government initiatives aimed at boosting local semiconductor industries, particularly in China and South Korea, which are aggressively promoting self-sufficiency in semiconductor production.

The market in the North America is anticipated to witness the fastest growth in the market during the forecast period, characterized by high technological innovation and the presence of major semiconductor companies, particularly in the US. The region is known for its advanced research and development capabilities in the field of semiconductor manufacturing, with a significant focus on developing next-generation semiconductor technologies.

This has led to a steady demand for CMP systems that are capable of handling the complexities of advanced semiconductor designs. The growth of the market in the region is influenced by the strategic activities of major IDM firms and foundries, as well as by the presence of leading universities and research institutions that contribute to the development of cutting-edge CMP technologies.

Semiconductor Chemical Mechanical Polishing (CMP) System Market Region

Segments

The Semiconductor Chemical Mechanical Polishing (CMP) System Market has been segmented on the basis of

Product Type

  • CMP Equipment
  • CMP Consumables

Application

  • Memory
  • Logic
  • Foundry
  • Others

End-user

  • Integrated Device Manufacturers
  • Foundries
  • Others

Region

  • Asia Pacific
  • North America
  • Latin America
  • Europe
  • Middle East & Africa

Key Players

  • Applied Materials Inc.
  • Ebara Corporation
  • Lam Research Corporation
  • Tokyo Electron Limited
  • Hitachi High-Technologies Corporation
  • ASM International N.V.
  • Disco Corporation
  • KLA Corporation
  • Rudolph Technologies Inc.
  • Veeco Instruments Inc
  •  Axus Technology
  • Revasum Inc.
  • Entrepix Inc.
  • SpeedFam Co., Ltd.
  • Logitech Ltd.
  • Lapmaster Wolters GmbH
  • Okamoto Machine Tool Works, Ltd.
  • Nanometrics Incorporated
  • Planar Semiconductor Inc.
  • GigaMat Technologies Inc.

Competitive Landscape

Key players in the semiconductor chemical mechanical polishing (CMP) system market are Applied Materials Inc.; Ebara Corporation; Lam Research Corporation; Tokyo Electron Limited; Hitachi High-Technologies Corporation; ASM International N.V.; Disco Corporation; KLA Corporation; Rudolph Technologies Inc.; Veeco Instruments Inc.; Axus Technology; Revasum Inc.; Entrepix Inc.; SpeedFam Co., Ltd.; Logitech Ltd.; Lapmaster Wolters GmbH; Okamoto Machine Tool Works, Ltd.; Nanometrics Incorporated; Planar Semiconductor Inc.; and GigaMat Technologies Inc.

Semiconductor Chemical Mechanical Polishing (CMP) System Market Keyplayers

Table Of Content

Chapter 1 Executive Summary
Chapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Semiconductor Chemical Mechanical Polishing (CMP) System Market Overview
   4.1 Introduction
      4.1.1 Market Taxonomy
      4.1.2 Market Definition
      4.1.3 Macro-Economic Factors Impacting the Market Growth
   4.2 Semiconductor Chemical Mechanical Polishing (CMP) System Market Dynamics
      4.2.1 Market Drivers
      4.2.2 Market Restraints
      4.2.3 Market Opportunity
   4.3 Semiconductor Chemical Mechanical Polishing (CMP) System Market - Supply Chain Analysis
      4.3.1 List of Key Suppliers
      4.3.2 List of Key Distributors
      4.3.3 List of Key Consumers
   4.4 Key Forces Shaping the Semiconductor Chemical Mechanical Polishing (CMP) System Market
      4.4.1 Bargaining Power of Suppliers
      4.4.2 Bargaining Power of Buyers
      4.4.3 Threat of Substitution
      4.4.4 Threat of New Entrants
      4.4.5 Competitive Rivalry
   4.5 Global Semiconductor Chemical Mechanical Polishing (CMP) System Market Size & Forecast, 2023-2032
      4.5.1 Semiconductor Chemical Mechanical Polishing (CMP) System Market Size and Y-o-Y Growth
      4.5.2 Semiconductor Chemical Mechanical Polishing (CMP) System Market Absolute $ Opportunity

Chapter 5 Global Semiconductor Chemical Mechanical Polishing (CMP) System Market Analysis and Forecast By Product Type
   5.1 Introduction
      5.1.1 Key Market Trends & Growth Opportunities By Product Type
      5.1.2 Basis Point Share (BPS) Analysis By Product Type
      5.1.3 Absolute $ Opportunity Assessment By Product Type
   5.2 Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By Product Type
      5.2.1 CMP Equipment and CMP Consumables
   5.3 Market Attractiveness Analysis By Product Type

Chapter 6 Global Semiconductor Chemical Mechanical Polishing (CMP) System Market Analysis and Forecast By Application
   6.1 Introduction
      6.1.1 Key Market Trends & Growth Opportunities By Application
      6.1.2 Basis Point Share (BPS) Analysis By Application
      6.1.3 Absolute $ Opportunity Assessment By Application
   6.2 Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By Application
      6.2.1 Memory
      6.2.2 Logic
      6.2.3 Foundry
      6.2.4 Others
   6.3 Market Attractiveness Analysis By Application

Chapter 7 Global Semiconductor Chemical Mechanical Polishing (CMP) System Market Analysis and Forecast By End-user
   7.1 Introduction
      7.1.1 Key Market Trends & Growth Opportunities By End-user
      7.1.2 Basis Point Share (BPS) Analysis By End-user
      7.1.3 Absolute $ Opportunity Assessment By End-user
   7.2 Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By End-user
      7.2.1 Integrated Device Manufacturers
      7.2.2 Foundries
      7.2.3 Others
   7.3 Market Attractiveness Analysis By End-user

Chapter 8 Global Semiconductor Chemical Mechanical Polishing (CMP) System Market Analysis and Forecast by Region
   8.1 Introduction
      8.1.1 Key Market Trends & Growth Opportunities By Region
      8.1.2 Basis Point Share (BPS) Analysis By Region
      8.1.3 Absolute $ Opportunity Assessment By Region
   8.2 Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By Region
      8.2.1 North America
      8.2.2 Europe
      8.2.3 Asia Pacific
      8.2.4 Latin America
      8.2.5 Middle East & Africa (MEA)
   8.3 Market Attractiveness Analysis By Region

Chapter 9 Coronavirus Disease (COVID-19) Impact 
   9.1 Introduction 
   9.2 Current & Future Impact Analysis 
   9.3 Economic Impact Analysis 
   9.4 Government Policies 
   9.5 Investment Scenario

Chapter 10 North America Semiconductor Chemical Mechanical Polishing (CMP) System Analysis and Forecast
   10.1 Introduction
   10.2 North America Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast by Country
      10.2.1 U.S.
      10.2.2 Canada
   10.3 Basis Point Share (BPS) Analysis by Country
   10.4 Absolute $ Opportunity Assessment by Country
   10.5 Market Attractiveness Analysis by Country
   10.6 North America Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By Product Type
      10.6.1 CMP Equipment and CMP Consumables
   10.7 Basis Point Share (BPS) Analysis By Product Type 
   10.8 Absolute $ Opportunity Assessment By Product Type 
   10.9 Market Attractiveness Analysis By Product Type
   10.10 North America Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By Application
      10.10.1 Memory
      10.10.2 Logic
      10.10.3 Foundry
      10.10.4 Others
   10.11 Basis Point Share (BPS) Analysis By Application 
   10.12 Absolute $ Opportunity Assessment By Application 
   10.13 Market Attractiveness Analysis By Application
   10.14 North America Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By End-user
      10.14.1 Integrated Device Manufacturers
      10.14.2 Foundries
      10.14.3 Others
   10.15 Basis Point Share (BPS) Analysis By End-user 
   10.16 Absolute $ Opportunity Assessment By End-user 
   10.17 Market Attractiveness Analysis By End-user

Chapter 11 Europe Semiconductor Chemical Mechanical Polishing (CMP) System Analysis and Forecast
   11.1 Introduction
   11.2 Europe Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast by Country
      11.2.1 Germany
      11.2.2 France
      11.2.3 Italy
      11.2.4 U.K.
      11.2.5 Spain
      11.2.6 Russia
      11.2.7 Rest of Europe
   11.3 Basis Point Share (BPS) Analysis by Country
   11.4 Absolute $ Opportunity Assessment by Country
   11.5 Market Attractiveness Analysis by Country
   11.6 Europe Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By Product Type
      11.6.1 CMP Equipment and CMP Consumables
   11.7 Basis Point Share (BPS) Analysis By Product Type 
   11.8 Absolute $ Opportunity Assessment By Product Type 
   11.9 Market Attractiveness Analysis By Product Type
   11.10 Europe Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By Application
      11.10.1 Memory
      11.10.2 Logic
      11.10.3 Foundry
      11.10.4 Others
   11.11 Basis Point Share (BPS) Analysis By Application 
   11.12 Absolute $ Opportunity Assessment By Application 
   11.13 Market Attractiveness Analysis By Application
   11.14 Europe Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By End-user
      11.14.1 Integrated Device Manufacturers
      11.14.2 Foundries
      11.14.3 Others
   11.15 Basis Point Share (BPS) Analysis By End-user 
   11.16 Absolute $ Opportunity Assessment By End-user 
   11.17 Market Attractiveness Analysis By End-user

Chapter 12 Asia Pacific Semiconductor Chemical Mechanical Polishing (CMP) System Analysis and Forecast
   12.1 Introduction
   12.2 Asia Pacific Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast by Country
      12.2.1 China
      12.2.2 Japan
      12.2.3 South Korea
      12.2.4 India
      12.2.5 Australia
      12.2.6 South East Asia (SEA)
      12.2.7 Rest of Asia Pacific (APAC)
   12.3 Basis Point Share (BPS) Analysis by Country
   12.4 Absolute $ Opportunity Assessment by Country
   12.5 Market Attractiveness Analysis by Country
   12.6 Asia Pacific Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By Product Type
      12.6.1 CMP Equipment and CMP Consumables
   12.7 Basis Point Share (BPS) Analysis By Product Type 
   12.8 Absolute $ Opportunity Assessment By Product Type 
   12.9 Market Attractiveness Analysis By Product Type
   12.10 Asia Pacific Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By Application
      12.10.1 Memory
      12.10.2 Logic
      12.10.3 Foundry
      12.10.4 Others
   12.11 Basis Point Share (BPS) Analysis By Application 
   12.12 Absolute $ Opportunity Assessment By Application 
   12.13 Market Attractiveness Analysis By Application
   12.14 Asia Pacific Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By End-user
      12.14.1 Integrated Device Manufacturers
      12.14.2 Foundries
      12.14.3 Others
   12.15 Basis Point Share (BPS) Analysis By End-user 
   12.16 Absolute $ Opportunity Assessment By End-user 
   12.17 Market Attractiveness Analysis By End-user

Chapter 13 Latin America Semiconductor Chemical Mechanical Polishing (CMP) System Analysis and Forecast
   13.1 Introduction
   13.2 Latin America Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast by Country
      13.2.1 Brazil
      13.2.2 Mexico
      13.2.3 Rest of Latin America (LATAM)
   13.3 Basis Point Share (BPS) Analysis by Country
   13.4 Absolute $ Opportunity Assessment by Country
   13.5 Market Attractiveness Analysis by Country
   13.6 Latin America Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By Product Type
      13.6.1 CMP Equipment and CMP Consumables
   13.7 Basis Point Share (BPS) Analysis By Product Type 
   13.8 Absolute $ Opportunity Assessment By Product Type 
   13.9 Market Attractiveness Analysis By Product Type
   13.10 Latin America Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By Application
      13.10.1 Memory
      13.10.2 Logic
      13.10.3 Foundry
      13.10.4 Others
   13.11 Basis Point Share (BPS) Analysis By Application 
   13.12 Absolute $ Opportunity Assessment By Application 
   13.13 Market Attractiveness Analysis By Application
   13.14 Latin America Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By End-user
      13.14.1 Integrated Device Manufacturers
      13.14.2 Foundries
      13.14.3 Others
   13.15 Basis Point Share (BPS) Analysis By End-user 
   13.16 Absolute $ Opportunity Assessment By End-user 
   13.17 Market Attractiveness Analysis By End-user

Chapter 14 Middle East & Africa (MEA) Semiconductor Chemical Mechanical Polishing (CMP) System Analysis and Forecast
   14.1 Introduction
   14.2 Middle East & Africa (MEA) Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast by Country
      14.2.1 Saudi Arabia
      14.2.2 South Africa
      14.2.3 UAE
      14.2.4 Rest of Middle East & Africa (MEA)
   14.3 Basis Point Share (BPS) Analysis by Country
   14.4 Absolute $ Opportunity Assessment by Country
   14.5 Market Attractiveness Analysis by Country
   14.6 Middle East & Africa (MEA) Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By Product Type
      14.6.1 CMP Equipment and CMP Consumables
   14.7 Basis Point Share (BPS) Analysis By Product Type 
   14.8 Absolute $ Opportunity Assessment By Product Type 
   14.9 Market Attractiveness Analysis By Product Type
   14.10 Middle East & Africa (MEA) Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By Application
      14.10.1 Memory
      14.10.2 Logic
      14.10.3 Foundry
      14.10.4 Others
   14.11 Basis Point Share (BPS) Analysis By Application 
   14.12 Absolute $ Opportunity Assessment By Application 
   14.13 Market Attractiveness Analysis By Application
   14.14 Middle East & Africa (MEA) Semiconductor Chemical Mechanical Polishing (CMP) System Market Size Forecast By End-user
      14.14.1 Integrated Device Manufacturers
      14.14.2 Foundries
      14.14.3 Others
   14.15 Basis Point Share (BPS) Analysis By End-user 
   14.16 Absolute $ Opportunity Assessment By End-user 
   14.17 Market Attractiveness Analysis By End-user

Chapter 15 Competition Landscape 
   15.1 Semiconductor Chemical Mechanical Polishing (CMP) System Market: Competitive Dashboard
   15.2 Global Semiconductor Chemical Mechanical Polishing (CMP) System Market: Market Share Analysis, 2023
   15.3 Company Profiles (Details – Overview, Financials, Developments, Strategy) 
      15.3.1 Applied Materials Inc. Ebara Corporation Lam Research Corporation Tokyo Electron Limited Hitachi High-Technologies Corporation ASM International N.V. Disco Corporation KLA Corporation Rudolph Technologies Inc. Veeco Instruments Inc  Axus Technology Revasum Inc. Entrepix Inc. SpeedFam Co., Ltd. Logitech Ltd. Lapmaster Wolters GmbH Okamoto Machine Tool Works, Ltd. Nanometrics Incorporated Planar Semiconductor Inc. GigaMat Technologies Inc.

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