Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Share [2032]
Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Share [2032]
Segments - by Product Type (Thermal MFC, Pressure-based MFC, Coriolis MFC), by Flow Rate (Low-Flow, Medium-Flow, High-Flow), by Application (Physical Vapor Deposition and Chemical Vapor Deposition), by End-user (Semiconductor Manufacturing, Research Facilities, Others)
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Report Description
Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Outlook 2032
The global mass flow controller (MFC) for semiconductor PVD and CVD equipment market was valued at USD 1.2 Billion in 2022 and is projected to reach USD 2.7 Billion by 2032, growing at a CAGR of 8.5% from 2024 to 2030. The market growth is attributed to the surging demand for advanced semiconductor manufacturing techniques.
Mass flow controllers are precision instruments designed to assess and control the flow rate of gases in various industrial processes. They are essential in maintaining optimal conditions as they ensure accurate and consistent fluid flow. These functions are crucial in a variety of industrial sectors, including healthcare, oil &gas, environmental monitoring, and semiconductor manufacturing.
Semiconductors have become an integral part of electronics and machinery in recent years. The market is driven by trends such as miniaturization of existing chips &devices, the expansion of Internet-of-Things (IoT), and the advent of artificial intelligence (AI). The increasing demand is driving the need for advanced and sophisticated fabrication processes. The essential role of MFCs is likely to boost the MFC for the semiconductor PVD and CVD equipment market, as manufacturers seek to enhance current competency.
Mass Flow Controllers (MFC) for Semiconductor PVD and CVD Equipment Market Dynamics
Major Drivers
Increasing adoption of MFCs in the semiconductor manufacturing process is driving the market. The fabrication of complex semiconductors requires efficient and precise gas management which necessitates high-performance MFCs.
Global power houses such as Europe, the US, and South Korea are increasing efforts to bolster their production and packaging capabilities. Increasing demand for consumer electronics and automation across multiple industrial sectors as well asthe expansion of 5G technology only function to further the expansion of the market.
Physical vapor deposition (PVD) and chemical vapor deposition (CVD) are critical processes in the semiconductor manufacturing process. These processes are involved in creating thin films and microstructures that are essential to the functionality of semiconductors.
The films deposited are highly pure and uniform which are vital for reliable performance. Versatile techniques allow PVD and CVD equipment to produce a variety of materials to either deposit for conductive and connective purposes or create barrier layers to prevent metal diffusion into the silicon die.
Existing Restraints
The need for regular maintenance and calibration hinders the market. There is a high demand for precision, accuracy, and repeatability in manufacturing processesas minor deviations lead to defects. This results in increased operational costs and downtime for regular calibration and maintenance of the system.
Thestringent regulations regarding the safety of MFCsposeasignificant challenge in the market. PVD and CVD systems require complex, costly high vacuum conditions and precise control. The systems involve the use of hazardous chemicals and other materials which necessitate the use and placement of ventilation systems as well as protective equipment for personnel and safety measures to deal with any accidents.
It is a detail-intensive process that causes numerous setbacks in the manufacturing process. Additionally, the environmental impact is another concern in the market. A lot of energy and water are consumed while toxic chemicals, heavy metals, and greenhouse gases are released into the environment causing a significant ecological footprint.
Emerging Opportunities
The industry's aim for high efficiency, reliability, and precision is expected to create lucrative opportunities for market players during the forecast period. Adopting MFCs in the semiconductor PVD and CVD equipment improves the repeatability of the process, reduces the risk of human error, and allows for a high standard of production and performance. It provides consistent and reliable means of production irrespective of geographical location.
Industry adoption of Industry 4.0 principles and smart manufacturing techniques amid constant globalization is likely to create numerous opportunities in the market in the coming years.
Concepts of Industry 4.0 and smart manufacturing involve a framework wherein machine automation is highly integrated with data. The integration of MFCs in semiconductor manufacturing processes supplies accurate and in-depth analytical data that power individuals or systems to make decisions and improvements wherever necessary.
Scope of the Mass Flow Controller (MFC) for Semiconductor PVD and CVD Equipment Market Report
The market report includes an assessment of the market trends, segments, and regional markets. Overview and dynamics have also been included in the report.
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Attributes |
Details |
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Report Title |
Mass Flow Controller (MFC) for Semiconductor PVD and CVD Equipment Market - Global Industry Analysis, Growth, Share, Size, Trends, and Forecast |
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Base Year |
2023 |
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Historic Data |
2017-2022 |
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Forecast Period |
2024–2032 |
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Segmentation |
Product Type (Thermal MFCs, Pressure-based MFCs, and Coriolis MFCs), Flow rate(Low-flow, Medium-flow, and High-flow), Application (Physical Vapor Deposition and Chemical Vapor Deposition), and End-user (Semiconductor manufacturing, Research facilities, andothers) |
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Regional Scope |
Asia Pacific, North America, Latin America, Europe, and the Middle East & Africa |
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Report Coverage |
Company Share, Market Analysis and Size, Competitive Landscape, Growth Factors, Market Trends, and Revenue Forecast |
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Key Players Covered in the Report |
Accutherm Industrial co., LTD.; Azbil Corporation; Bronkhorst; Brooks Instrument; Fujikin; Hitachi, Ltd.; Horiba, Ltd.; MKS Instruments; Parker Hannifin Corp; Sierra Instruments, Inc.; and Others |
Mass Flow Controller (MFC) for Semiconductor PVD and CVD Equipment Market Segment Insights
Product Type Analysis
The MFC forsemiconductor PVD and CVD equipment market is segmented by product type into thermal MFCs, pressure-based MFCs, and Coriolis MFCs.
The thermal MFCs segmentholds a major share of the market due to their widespread use across pharmaceuticals, biotechnology, and chemical processing industries.
They are both accurate and repeatable while measuring the mass flow rate by detecting the temperature difference caused by the flow of gas over a heated sensor. The market demands ofprecision and wide range are fulfilled by these devices.
Pressure-based MFCs regulate the flow of gas by adjusting the pressure to ensure stable and accurate flow rates. They can handle high-pressure environments making them one of the integral components of semiconductor manufacturing applications.These are engineered for high-flow path and ultra-fast response time.
Therefore,the demand for pressure-based MFCs is expected to grow in the coming years, driven by the evolution of the semiconductor industry and its need for enhanced accuracy and stability in the manufacturing process.
The Coriolis MFCs segmentis projected to expand at a significant growth rate duringthe forecast period owing to its accuracy. They measure both mass flow and density and provide accurate measurements.
These qualities are invaluable for industries facing unrelenting pressure to increase production from existing systems and facilities. They have many different applications in various industries and scientific ventures, as they measure both corrosive and clean gases and liquids.
Flow Rate Analysis
In terms of flow rate, the global market is segregated into low flow, medium flow, and high flow.Low-flow MFCs are utilized most in applications where minute quantities of gas aremanaged with high precision. These controllers excel in processes that require ultra-low gas flows, especially in the production process of miniaturized electronic components, which is expected to boost the segment in the coming years.
Medium-flow MFCs cater to a broad range of applications. In the semiconductor industry, they’re used for wafer cleaning, CVD, thin film deposition, gas &spray coating, and others.
Additionally, they are used for gas blending, plasma cutting, and welding. The medium flow MFCs segment is expected to rise during the forecast period, due to their wide application range.
High-flow MFCs are designed to handle large volumes of gas. They are essential for processes that require high flow rates such as controlling the reactive gases in CVD, plasma sources of PVD, and etching gases.
They are used in chemical processing and research laboratories for a variety of applications. Furthermore, high-flow MFCs are used to supply odorant to natural gas, which is a vital safety measure to help in the detection of leaks and prevent accidents.
Application Analysis
On the basis of application, the market is largely categorized into physical vapor deposition (PVD) and chemical vapor deposition (CVD).
Physical vapor deposition (PVD) takes solid precursor material and turns it into gas in a chamber, where there is a deposition of a thin film on the substrate through condensation.
It is usually achieved through thermal evaporation or a technique known as sputtering. The main advantages of PVD lie in temperature resistance, abrasion &impact resistance, environmental sustainability, and wear-resistant coating.
Chemical vapor deposition (CVD) uses volatile precursors instead of solids to deposit a gaseous material on the surface of the substrate. The polymerization and coating phases happen at the same time which creates copolymers for a wide range of applications. CVD offers high purity, uniform coating (even on uneven surfaces), and a wider application range than PVD while costing less than PVD systems.
PVD and CVD suit different applications depending on the material, required purity, speed, and budget constraints. Increasing integration of IoT and AI has raised the demand for MFCs in both, PVD and CVD. Advanced technologies require semiconductors with high precision and reliability, necessitating the integration of MFCs.
End-user Outlook
Based on end-users, the global market is divided into semiconductor manufacturing, research facilities,and others.
The semiconductor manufacturing segment dominated the market in 2023, due to the emergence of Industry 4.0 and the arrival of artificial intelligence (AI) globally.
According to the Semiconductor Industry Association (SIA), the global sales of semiconductors increased by 5.3% in the period between November 2022-23. MFCs play a crucial role in the fabrication process, being an integral part of systems including, although not limited to, PVD, CVD, etching, ion implantation, and thermal processing.
Research facilities represent another end-user segment. Industrial R&D departments are involved in the development of new materials and processes that require precise control of gas flows to yield high-quality results. The repeatability and reliability of MFCs are essential for continuous innovation and experimentation in research, driving the demand for advanced MFCs.
Regional Outlook
In terms of region, the global mass flow controller for semiconductor PVD and CVD equipment market is classified as Asia Pacific, North America, Latin America, Europe, and the Middle East &Africa.
North America held a major market share in 2023, due to the presence of several key players across various industry segments and a large number of educational institutions in the region.Ithas been involved heavily in new technological developments and applications.
The region benefits from major companies such as Applied Materials and Lam Research, government investments in R&D, and policies such as the CHIPS Act,as well asa focus on AI/ML technologies to boost manufacturing facilities.
The market in Asia Pacific is projected to grow at a significant pace in the forecast period as a result of rampant industrialization.Countries such as China, Taiwan, and South Korea are manufacturing powerhouses.
Government-led initiatives, such as Make in China 2025, and growing infrastructure are propelling the need for MFCs in the region. Foreign investments have soaredasglobal companies are looking for low production costs. Newly developed and localized innovation centers are augmenting supply chains with a focus on PVD and CVD methodologies.
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In September 2024, the Brooks Instrument opened a new manufacturing plant in Malaysia. The fourth manufacturing facility highlights production and partnership opportunities with key customers in the Asia-Pacific.
Countries in Europe, the Middle East, and Africa are developing the necessary infrastructure and facilities mainly driven by industrial growth in pharmaceuticals, biotechnology, and analytical instrumentation. The United Arab Emirates (UAE) market is poised to grow significantly over the forecast period with significant investments in the oil &gas, manufacturing, aerospace, and healthcare sectors.
Segments
The mass flow controllers for semiconductor PVD and CVD equipment market have been segmented on the basis of
Type
- Thermal Type MFC
- Pressure type MFC
- Coriolis MFC
Flow Rate
- Low Flow
- Medium Flow
- High Flow
Application
- Physical Vapor Deposition
- Chemical Vapor Deposition
End User
- Semiconductor Manufacturing
- Research Laboratories
- Others
Region
- North America
- Asia Pacific
- Europe
- Middle East & Africa
- Latin America
Key-Players
- Accutherm Industrial co., LTD.
- Azbil Corporation
- Bronkhorst
- Brooks Instrument
- Fujikin
- Hitachi, Ltd.
- Horiba, Ltd.
- MKS Instruments
- Parker Hannifin Corp
- Sierra Instruments, Inc.
Competitive Landscape
Some of the key players in the market are Accutherm Industrial co., LTD.; Azbil Corporation; Bronkhorst; Brooks Instrument; Fujikin; Hitachi, Ltd.; Horiba, Ltd.; MKS Instruments; Parker Hannifin Corp; Sierra Instruments, Inc.;andothers. These companies have a major share of the market and are responsible for the market trends.
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In January 2024, Alicat Scientific added a high flow range of up to 100 SLPM to its BASIS 2 line of low-cost MEMS-thermal mass flow controllers and meters. The new model retains the compactness, althoughhas several options for customization with the new large flow body. The approach means projects that need customization can adapt the concept to their needs.
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In March 2024, Brooks Instrument introduced the GF120xHT series. This is the company’s first high-temperature mass flow controller in the GF family and is specifically designed to support solid and liquid precursors required in semiconductor manufacturing.
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InApril 2024, Bronkhorst announced the expansion of their FLEXI-FLOW Compact series. The latest iteration of the FLEXI-FLOW Compact series introduces a range of innovative models and features, including instruments tailored for lower flow ranges. Additionally, the series now includes downported instruments and flow controllers equipped with integrated shut-off valves. Another key enhancement is the incorporation of ethernet communication.
Table Of Content
Chapter 1 Executive SummaryChapter 2 Assumptions and Acronyms Used
Chapter 3 Research Methodology
Chapter 4 Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Overview
4.1 Introduction
4.1.1 Market Taxonomy
4.1.2 Market Definition
4.1.3 Macro-Economic Factors Impacting the Market Growth
4.2 Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Dynamics
4.2.1 Market Drivers
4.2.2 Market Restraints
4.2.3 Market Opportunity
4.3 Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market - Supply Chain Analysis
4.3.1 List of Key Suppliers
4.3.2 List of Key Distributors
4.3.3 List of Key Consumers
4.4 Key Forces Shaping the Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market
4.4.1 Bargaining Power of Suppliers
4.4.2 Bargaining Power of Buyers
4.4.3 Threat of Substitution
4.4.4 Threat of New Entrants
4.4.5 Competitive Rivalry
4.5 Global Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size & Forecast, 2023-2032
4.5.1 Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size and Y-o-Y Growth
4.5.2 Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Absolute $ Opportunity
Chapter 5 Global Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Analysis and Forecast By Product Type
5.1 Introduction
5.1.1 Key Market Trends & Growth Opportunities By Product Type
5.1.2 Basis Point Share (BPS) Analysis By Product Type
5.1.3 Absolute $ Opportunity Assessment By Product Type
5.2 Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Product Type
5.2.1 Thermal MFC
5.2.2 Pressure-based MFC
5.2.3 Coriolis MFC
5.3 Market Attractiveness Analysis By Product Type
Chapter 6 Global Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Analysis and Forecast By Flow Rate
6.1 Introduction
6.1.1 Key Market Trends & Growth Opportunities By Flow Rate
6.1.2 Basis Point Share (BPS) Analysis By Flow Rate
6.1.3 Absolute $ Opportunity Assessment By Flow Rate
6.2 Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Flow Rate
6.2.1 Low-Flow
6.2.2 Medium-Flow
6.2.3 High-Flow
6.3 Market Attractiveness Analysis By Flow Rate
Chapter 7 Global Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Analysis and Forecast By Application
7.1 Introduction
7.1.1 Key Market Trends & Growth Opportunities By Application
7.1.2 Basis Point Share (BPS) Analysis By Application
7.1.3 Absolute $ Opportunity Assessment By Application
7.2 Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Application
7.2.1 Physical Vapor Deposition and Chemical Vapor Deposition
7.3 Market Attractiveness Analysis By Application
Chapter 8 Global Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Analysis and Forecast By End-user
8.1 Introduction
8.1.1 Key Market Trends & Growth Opportunities By End-user
8.1.2 Basis Point Share (BPS) Analysis By End-user
8.1.3 Absolute $ Opportunity Assessment By End-user
8.2 Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By End-user
8.2.1 Semiconductor Manufacturing
8.2.2 Research Facilities
8.2.3 Others
8.3 Market Attractiveness Analysis By End-user
Chapter 9 Global Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Analysis and Forecast by Region
9.1 Introduction
9.1.1 Key Market Trends & Growth Opportunities By Region
9.1.2 Basis Point Share (BPS) Analysis By Region
9.1.3 Absolute $ Opportunity Assessment By Region
9.2 Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Region
9.2.1 North America
9.2.2 Europe
9.2.3 Asia Pacific
9.2.4 Latin America
9.2.5 Middle East & Africa (MEA)
9.3 Market Attractiveness Analysis By Region
Chapter 10 Coronavirus Disease (COVID-19) Impact
10.1 Introduction
10.2 Current & Future Impact Analysis
10.3 Economic Impact Analysis
10.4 Government Policies
10.5 Investment Scenario
Chapter 11 North America Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Analysis and Forecast
11.1 Introduction
11.2 North America Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast by Country
11.2.1 U.S.
11.2.2 Canada
11.3 Basis Point Share (BPS) Analysis by Country
11.4 Absolute $ Opportunity Assessment by Country
11.5 Market Attractiveness Analysis by Country
11.6 North America Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Product Type
11.6.1 Thermal MFC
11.6.2 Pressure-based MFC
11.6.3 Coriolis MFC
11.7 Basis Point Share (BPS) Analysis By Product Type
11.8 Absolute $ Opportunity Assessment By Product Type
11.9 Market Attractiveness Analysis By Product Type
11.10 North America Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Flow Rate
11.10.1 Low-Flow
11.10.2 Medium-Flow
11.10.3 High-Flow
11.11 Basis Point Share (BPS) Analysis By Flow Rate
11.12 Absolute $ Opportunity Assessment By Flow Rate
11.13 Market Attractiveness Analysis By Flow Rate
11.14 North America Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Application
11.14.1 Physical Vapor Deposition and Chemical Vapor Deposition
11.15 Basis Point Share (BPS) Analysis By Application
11.16 Absolute $ Opportunity Assessment By Application
11.17 Market Attractiveness Analysis By Application
11.18 North America Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By End-user
11.18.1 Semiconductor Manufacturing
11.18.2 Research Facilities
11.18.3 Others
11.19 Basis Point Share (BPS) Analysis By End-user
11.20 Absolute $ Opportunity Assessment By End-user
11.21 Market Attractiveness Analysis By End-user
Chapter 12 Europe Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Analysis and Forecast
12.1 Introduction
12.2 Europe Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast by Country
12.2.1 Germany
12.2.2 France
12.2.3 Italy
12.2.4 U.K.
12.2.5 Spain
12.2.6 Russia
12.2.7 Rest of Europe
12.3 Basis Point Share (BPS) Analysis by Country
12.4 Absolute $ Opportunity Assessment by Country
12.5 Market Attractiveness Analysis by Country
12.6 Europe Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Product Type
12.6.1 Thermal MFC
12.6.2 Pressure-based MFC
12.6.3 Coriolis MFC
12.7 Basis Point Share (BPS) Analysis By Product Type
12.8 Absolute $ Opportunity Assessment By Product Type
12.9 Market Attractiveness Analysis By Product Type
12.10 Europe Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Flow Rate
12.10.1 Low-Flow
12.10.2 Medium-Flow
12.10.3 High-Flow
12.11 Basis Point Share (BPS) Analysis By Flow Rate
12.12 Absolute $ Opportunity Assessment By Flow Rate
12.13 Market Attractiveness Analysis By Flow Rate
12.14 Europe Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Application
12.14.1 Physical Vapor Deposition and Chemical Vapor Deposition
12.15 Basis Point Share (BPS) Analysis By Application
12.16 Absolute $ Opportunity Assessment By Application
12.17 Market Attractiveness Analysis By Application
12.18 Europe Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By End-user
12.18.1 Semiconductor Manufacturing
12.18.2 Research Facilities
12.18.3 Others
12.19 Basis Point Share (BPS) Analysis By End-user
12.20 Absolute $ Opportunity Assessment By End-user
12.21 Market Attractiveness Analysis By End-user
Chapter 13 Asia Pacific Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Analysis and Forecast
13.1 Introduction
13.2 Asia Pacific Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast by Country
13.2.1 China
13.2.2 Japan
13.2.3 South Korea
13.2.4 India
13.2.5 Australia
13.2.6 South East Asia (SEA)
13.2.7 Rest of Asia Pacific (APAC)
13.3 Basis Point Share (BPS) Analysis by Country
13.4 Absolute $ Opportunity Assessment by Country
13.5 Market Attractiveness Analysis by Country
13.6 Asia Pacific Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Product Type
13.6.1 Thermal MFC
13.6.2 Pressure-based MFC
13.6.3 Coriolis MFC
13.7 Basis Point Share (BPS) Analysis By Product Type
13.8 Absolute $ Opportunity Assessment By Product Type
13.9 Market Attractiveness Analysis By Product Type
13.10 Asia Pacific Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Flow Rate
13.10.1 Low-Flow
13.10.2 Medium-Flow
13.10.3 High-Flow
13.11 Basis Point Share (BPS) Analysis By Flow Rate
13.12 Absolute $ Opportunity Assessment By Flow Rate
13.13 Market Attractiveness Analysis By Flow Rate
13.14 Asia Pacific Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Application
13.14.1 Physical Vapor Deposition and Chemical Vapor Deposition
13.15 Basis Point Share (BPS) Analysis By Application
13.16 Absolute $ Opportunity Assessment By Application
13.17 Market Attractiveness Analysis By Application
13.18 Asia Pacific Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By End-user
13.18.1 Semiconductor Manufacturing
13.18.2 Research Facilities
13.18.3 Others
13.19 Basis Point Share (BPS) Analysis By End-user
13.20 Absolute $ Opportunity Assessment By End-user
13.21 Market Attractiveness Analysis By End-user
Chapter 14 Latin America Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Analysis and Forecast
14.1 Introduction
14.2 Latin America Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast by Country
14.2.1 Brazil
14.2.2 Mexico
14.2.3 Rest of Latin America (LATAM)
14.3 Basis Point Share (BPS) Analysis by Country
14.4 Absolute $ Opportunity Assessment by Country
14.5 Market Attractiveness Analysis by Country
14.6 Latin America Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Product Type
14.6.1 Thermal MFC
14.6.2 Pressure-based MFC
14.6.3 Coriolis MFC
14.7 Basis Point Share (BPS) Analysis By Product Type
14.8 Absolute $ Opportunity Assessment By Product Type
14.9 Market Attractiveness Analysis By Product Type
14.10 Latin America Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Flow Rate
14.10.1 Low-Flow
14.10.2 Medium-Flow
14.10.3 High-Flow
14.11 Basis Point Share (BPS) Analysis By Flow Rate
14.12 Absolute $ Opportunity Assessment By Flow Rate
14.13 Market Attractiveness Analysis By Flow Rate
14.14 Latin America Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Application
14.14.1 Physical Vapor Deposition and Chemical Vapor Deposition
14.15 Basis Point Share (BPS) Analysis By Application
14.16 Absolute $ Opportunity Assessment By Application
14.17 Market Attractiveness Analysis By Application
14.18 Latin America Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By End-user
14.18.1 Semiconductor Manufacturing
14.18.2 Research Facilities
14.18.3 Others
14.19 Basis Point Share (BPS) Analysis By End-user
14.20 Absolute $ Opportunity Assessment By End-user
14.21 Market Attractiveness Analysis By End-user
Chapter 15 Middle East & Africa (MEA) Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Analysis and Forecast
15.1 Introduction
15.2 Middle East & Africa (MEA) Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast by Country
15.2.1 Saudi Arabia
15.2.2 South Africa
15.2.3 UAE
15.2.4 Rest of Middle East & Africa (MEA)
15.3 Basis Point Share (BPS) Analysis by Country
15.4 Absolute $ Opportunity Assessment by Country
15.5 Market Attractiveness Analysis by Country
15.6 Middle East & Africa (MEA) Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Product Type
15.6.1 Thermal MFC
15.6.2 Pressure-based MFC
15.6.3 Coriolis MFC
15.7 Basis Point Share (BPS) Analysis By Product Type
15.8 Absolute $ Opportunity Assessment By Product Type
15.9 Market Attractiveness Analysis By Product Type
15.10 Middle East & Africa (MEA) Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Flow Rate
15.10.1 Low-Flow
15.10.2 Medium-Flow
15.10.3 High-Flow
15.11 Basis Point Share (BPS) Analysis By Flow Rate
15.12 Absolute $ Opportunity Assessment By Flow Rate
15.13 Market Attractiveness Analysis By Flow Rate
15.14 Middle East & Africa (MEA) Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By Application
15.14.1 Physical Vapor Deposition and Chemical Vapor Deposition
15.15 Basis Point Share (BPS) Analysis By Application
15.16 Absolute $ Opportunity Assessment By Application
15.17 Market Attractiveness Analysis By Application
15.18 Middle East & Africa (MEA) Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market Size Forecast By End-user
15.18.1 Semiconductor Manufacturing
15.18.2 Research Facilities
15.18.3 Others
15.19 Basis Point Share (BPS) Analysis By End-user
15.20 Absolute $ Opportunity Assessment By End-user
15.21 Market Attractiveness Analysis By End-user
Chapter 16 Competition Landscape
16.1 Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market: Competitive Dashboard
16.2 Global Mass Flow Controller (MFC) for Semiconductor PVD & CVD Equipment Market: Market Share Analysis, 2023
16.3 Company Profiles (Details – Overview, Financials, Developments, Strategy)
16.3.1 Accutherm Industrial co., LTD. Azbil Corporation Bronkhorst Brooks Instrument Fujikin Hitachi, Ltd. Horiba, Ltd. MKS Instruments Parker Hannifin Corp Sierra Instruments, Inc.
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